| With MOCVD film technology, film chemical composition is easier to control, deposition temperature lower, deposition speed higher, deposited film more compact, homogenous and flat as compared with typical ceramic film formation technology. Some TiO2 thin films grew, with MOCVD system made in our laboratory, on high doped (100) Si wafer and on conductive-film-coated glass respectively. The measured I-V and C-V characteristics clearly show MIS structure behavior of the samples of 1 mm Au dot/TiO2 film/p+-Si. Those films deposited on conductive-film-coated glass have electrochromic phenomena.(11 refs.) |
